Transpector® XPR 3+ Residual Gas Analyzer


MONITOR AND CONTROL RAPID PROCESS CHANGES

The new Transpector XPR 3+ Residual Gas Analyzer (RGA) provides industry-leading measurement speeds to monitor and control the rapid process changes required for modern semiconductor and display manufacturing. Transpector XPR 3+ is ideal for in-situ air leak, gas purity, hydrocarbon, and contamination monitoring. Real time measurement with the Transpector XPR 3+ provides far superior product protection compared to periodic rate of rise tests.

 

DRIVNG PROFITABILITY BY MAXIMIZING TOOL UPTIME

The Transpector XPR 3+ RGA is a field proven quadrupole and dual ion source sensor for sputtering pressure range applications. No pressure conversion equipment is required, long lifetime components, and the ability to rapidly detect and diagnose problems combine to maximize tool availability, product throughput and yield. The sensor can be operated continuously from high vacuum to 20 mTorr, without the need for pumps. The Transpector XPR 3+ dual ion source’s chambers are designed to limit coating to maintain ion source sensitivity and extend the sensor’s mean time to maintenance.

Benefits

  • Real time wafer and panel protection due to high sensitivity air leak and contamination detection from high vacuum to PVD process pressures
  • Maximize PM efficiency and tool uptime, with rapid and reliable chamber qualification
  • Minimize total cost of ownership with the longer lifetime, contamination resistant, dual ion source design; monitors up to 20 mTorr without the need for pumps. Low pressure EM variant provides cost sensitive alternative
  • Seamless fab integration and reliable interdiction through powerful data acquisition and synchronization
  • Enhance unique manufacturing capabilities with tailored recipe optimization
  • Protects critical process needs with immediate on-site response from experts

Typical Applications

  • PVD and sputtering process modules
  • Preclean modules
  • Non-cluster PVD tools
  • Clamped degas modules

Specifications

Type 1-100 amu
Resolution¹ <1 @ 10% measured at mass 4, 20, 28 and 40
Detector type Off-axis FC and microchannel plate EM
Temperature coefficient² <1% of peak height per °C
Mass position stability³ <0.1 amu over 24 hours⁹
Peak ratio stability⁴ <2% over 24 hours
Sensitivity (FC mode)⁵ ≥4E-7 amps/Torr (3E-7 amps/mbar)
Sensitivity (nominal)⁵ ≥8E-3 amps/Torr (3E-3 amps/mbar)
Minimum detectable partial pressure⁶ (FC mode)⁵ ≤1E-9 Torr (1.3E-9 mbar)
Minimum detectable partial pressure⁶ (EM mode)⁵ ≤6E-12 Torr (8E-12 mbar)
Maximum operating pressure (FC or EM mode) 20 mTorr (2.6E-2 mbar)
Maximum operating pressure (linear operation) 10 mTorr (1.3E-2 mbar)
Maximum sensor operating temperature 150°C
Maximum bakeout temperature⁷ 200°C
Detection Limit⁸ 10 ppm
Ambient operating temperature 5 – 50°C
Power input 20 – 30 V (dc), 30W max
Ethernet Communications Interface Standard: CAT5e Ethernet cable connection
Standard I/O One analog input, two digital inputs, one relay, 24 V at 0.5 A
Extended I/O (optional) Four analog inputs, four analog outputs, four relays, 24 V at 0.5 A, 12 digital inputs or outputs
1Per 1993 AVS recommended practice
2
FC signal at 1E-4 Torr of Ar
3
FC signal at 1E-4 Torr of Ar with constant STP
4
Mass peak ratios 2/40, 4/40, 20/40, 28/40
5
at 40 eV/200 μA
6
MDPP is calculated as the standard deviation of the noise divided by the sensitivity of the
sensor measured at a 4-second dwell time.
7
with electronics removed
8
at 1 – 5 mTorr process pressure
9
Peak Lock active for 24-hour mass position stability.

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