Sion™ RF Detector for Plasma Arc Detection

 

 

NON-INVASIVE, CLAMP-ON RF DETECTOR DELIVERS HIGH-SPEED ARC DETECTION IN iPVD, PECVD AND ETCH

Reducing Wafer Loss and Improving Yields
Arcing during plasma processing can result in target and chamber damage leading to substrate damage and particle creation. As feature sizes decrease, microelectronic devices become increasingly susceptible to arc-induced damage. Arcing can occur in any plasma assisted process such as ionized Physical Vapor Deposition (iPVD), Plasma Enhanced Chemical Vapor Deposition (PECVD) and Etch. The INFICON Sion Arc Detector provides a crucial first line of defense. Sion makes it possible to detect micro-arcs quickly and react to them before significant damage or scrap occurs. The system provides real-time detection and analysis of plasma micro-arcing events.

Features

  • Easy retrofit to existing tool set
  • Non-invasive sensor installation
  • High-speed data collection (250 kHz)
  • Integrated data management with FabGuard
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